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Stencil lithography is a novel patterning method based on surface processing through a membrane having micro- and nanometer size apertures. It reduces the number of process steps in high resolution patterning from 7 to 1. Due to the reduced process complexity, this technique improves conventional lithography: it is faster, cleaner and more cost efficient. Stencil-based patterning is not limited to local deposition of material, but can be extended to local ion implantation and etching of thin films. It therefore offers improvements for the entire processing sequence to build microchips for micro/nano-systems in silicon, polymer and other materials.

 
     
           
 
       
 
           
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